Following the closure of his label last summer, Christopher Kane is a name still sorely missed from the London Fashion Week schedule but, fans of the brand will be delighted to hear that the designer is set to release a new collection this autumn underneath the Self-Portrait label.
It was announced today, as London Fashion Week SS25 officially kicked off, that Kane had been chosen as the first guest designer in Self-Portrait’s new Residency programme.
The initiative will invite various creatives into the Self-Portrait studio to help reinterpret the Self-Portrait look. In a similar fashion to how Jean Paul Gaultier’s couture arm now functions, the project will bring together different designer ideas and will help to support and promote creatives.
“Having spent the last 10 years building our brand and honing our team’s skills, it feels incredibly rewarding to share our expertise and techniques with others, giving them the keys to our studio, and the space to explore and expand their own craft, while staying true to our commitment to honest luxury,” explained Self-Portrait’s founder and creative director Han Chong.
Kane has been a huge force in British fashion for some time, and the industry will be thrilled to hear of his comeback. The designer first emerged on the scene in the early 2000s, and quickly became beloved on the red carpet, worn frequently by names including Alexa Chung and Cate Blanchett, while Michelle Obama and the Duchess of Cambridge also stepped out in his designs. He also won various prestigious fashion awards as his company rose to prominence.
Christopher Kane’s collection for Self-Portrait is set to be released this November, when more details about the Residency programme will also be revealed, along with names that will be taking part in the future.
